GVD Coating Technology

GVD’s core technology is a polymer vapor deposition process that was initially developed at MIT. In a single step, without exposing the product to high temperatures, solvents or other harsh processing conditions, our coating systems apply a nanometers or microns thin coating to enhance a product in some way. The process is thoroughly controlled by using equipment and systems that mimic the desired repeatability of semiconductor fabrication technology.

To start, we place products in our coating system, close it up, then introduce a commercially available precursor gas, or mixture of gases, into the system. This material is energized by a heat source in the chamber, breaking a very specific bond in the precursor. A monomer unit breaks off and is very reactive, driven to find a place to land and polymerize with other reactive monomer units. Depending on what coating is being deposited, the system either creates a highly crosslinked polymer that is extremely effective at protecting electronics in harsh environments or it creates long homopolymer chains of PTFE that make the surface hydrophobic and slippery. After the process runs its course, the product is ready to be used. No additional processing, curing or steps are required.

The process can be considered a "platform technology" with over 70 different polymers having been deposited in academic laboratories and research institutions. GVD has demonstrated that the coating process is scalable; while we focus on key coating product lines, we are open to working with customers to transfer new polymer chemistries to our bench-top systems in our own laboratory through development projects.

If you would like to learn more about our technology, explore our Products page or learn about their use as industry Solutions.

If you have any other questions about the technology, please contact us today.